Wavefront Metrology for High Resolution Optical Systems
Author | : Ryan Miyakawa |
Publisher | : |
Total Pages | : 252 |
Release | : 2011 |
Genre | : |
ISBN | : |
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Next generation extreme ultraviolet (EUV) optical systems are moving to higher resolution optics to accommodate smaller length scales targeted by the semiconductor industry. As the numerical apertures (NA) of the optics become larger, it becomes increasingly difficult to characterize aberrations due to experimental challenges associated with high-resolution spatial filters and geometrical effects caused by large incident angles of the test wavefront. This dissertation focuses on two methods of wavefront metrology for high resolution optical systems. The first method, lateral shearing interferometry (LSI), is a self-referencing interferometry where the test wavefront is incident on a low spatial frequency grating, and the resulting interference between the diffracted orders is used to reconstruct the wavefront aberrations. LSI has many advantages over other interferometric tests such as phase-shifting point diffraction interferometry (PS/PDI) due to its experimental simplicity, stability, relaxed coherence requirements, and its ability to scale to high numerical apertures. While LSI has historically been a qualitative test, this dissertation presents a novel quantitative investigation of the LSI interferogram. The analysis reveals the existence of systematic aberrations due to the nonlinear angular response from the diffraction grating that compromises the accuracy of LSI at medium to high NAs. In the medium NA regime (0.15