Thin Film Phenomena

Thin Film Phenomena
Author: Kasturi L. Chopra
Publisher:
Total Pages: 872
Release: 1979
Genre: Technology & Engineering
ISBN:

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Thin Film Phenomena

Thin Film Phenomena
Author: Symposium on thin film phenomena
Publisher:
Total Pages: 0
Release: 1978
Genre:
ISBN:

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Nanoscale Phenomena in Ferroelectric Thin Films

Nanoscale Phenomena in Ferroelectric Thin Films
Author: Seungbum Hong
Publisher: Springer Science & Business Media
Total Pages: 294
Release: 2013-11-27
Genre: Technology & Engineering
ISBN: 1441990445

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This book presents the recent advances in the field of nanoscale science and engineering of ferroelectric thin films. It comprises two main parts, i.e. electrical characterization in nanoscale ferroelectric capacitor, and nano domain manipulation and visualization in ferroelectric materials. Well known le'adingexperts both in relevant academia and industry over the world (U.S., Japan, Germany, Switzerland, Korea) were invited to contribute to each chapter. The first part under the title of electrical characterization in nanoscale ferroelectric capacitors starts with Chapter 1, "Testing and characterization of ferroelectric thin film capacitors," written by Dr. I. K. Yoo. The author provides a comprehensive review on basic concepts and terminologies of ferroelectric properties and their testing methods. This chapter also covers reliability issues in FeRAMs that are crucial for commercialization of high density memory products. In Chapter 2, "Size effects in ferroelectric film capacitors: role ofthe film thickness and capacitor size," Dr. I. Stolichnov discusses the size effects both in in-plane and out-of-plane dimensions of the ferroelectric thin film. The author successfully relates the electric performance and domain dynamics with proposed models of charge injection and stress induced phase transition. The author's findings present both a challenging problem and the clue to its solution of reliably predicting the switching properties for ultra-thin ferroelectric capacitors. In Chapter 3, "Ferroelectric thin films for memory applications: nanoscale characterization by scanning force microscopy," Prof. A.

Thin Film Processes

Thin Film Processes
Author: Jagannathan Thirumalai
Publisher: BoD – Books on Demand
Total Pages: 222
Release: 2017-04-12
Genre: Science
ISBN: 9535130676

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The book Thin Film Processes - Artifacts on Surface Phenomena and Technological Facets presents topics on global advancements in theoretical and experimental facts, instrumentation and practical applications of thin-film material perspectives and its applications. The aspect of this book is associated with the thin-film physics, the methods of deposition, optimization parameters and its wide technological applications. This book is divided into three main sections: Thin Film Deposition Methods: A Synthesis Perspective; Optimization Parameters in the Thin Film Science and Application of Thin Films: A Synergistic Outlook. Collected chapters provide applicable knowledge for a wide range of readers: common men, students and researchers. It was constructed by experts in diverse fields of thin-film science and technology from over 15 research institutes across the globe.

Chemical Vapor Deposition

Chemical Vapor Deposition
Author: Srinivasan Sivaram
Publisher: Springer Science & Business Media
Total Pages: 302
Release: 2013-11-11
Genre: Technology & Engineering
ISBN: 1475747519

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In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.

Metal Oxide-Based Thin Film Structures

Metal Oxide-Based Thin Film Structures
Author: Nini Pryds
Publisher: Elsevier
Total Pages: 562
Release: 2017-09-07
Genre: Technology & Engineering
ISBN: 0081017529

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Metal Oxide-Based Thin Film Structures: Formation, Characterization and Application of Interface-Based Phenomena bridges the gap between thin film deposition and device development by exploring the synthesis, properties and applications of thin film interfaces. Part I deals with theoretical and experimental aspects of epitaxial growth, the structure and morphology of oxide-metal interfaces deposited with different deposition techniques and new developments in growth methods. Part II concerns analysis techniques for the electrical, optical, magnetic and structural properties of thin film interfaces. In Part III, the emphasis is on ionic and electronic transport at the interfaces of Metal-oxide thin films. Part IV discusses methods for tailoring metal oxide thin film interfaces for specific applications, including microelectronics, communication, optical electronics, catalysis, and energy generation and conservation. This book is an essential resource for anyone seeking to further their knowledge of metal oxide thin films and interfaces, including scientists and engineers working on electronic devices and energy systems and those engaged in research into electronic materials. Introduces the theoretical and experimental aspects of epitaxial growth for the benefit of readers new to the field Explores state-of-the-art analysis techniques and their application to interface properties in order to give a fuller understanding of the relationship between macroscopic properties and atomic-scale manipulation Discusses techniques for tailoring thin film interfaces for specific applications, including information, electronics and energy technologies, making this book essential reading for materials scientists and engineers alike

Principles of Vapor Deposition of Thin Films

Principles of Vapor Deposition of Thin Films
Author: Professor K.S. K.S Sree Harsha
Publisher: Elsevier
Total Pages: 1173
Release: 2005-12-16
Genre: Technology & Engineering
ISBN: 0080480314

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The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.