Principles Of Vapor Deposition Of Thin Films
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Author | : Professor K.S. K.S Sree Harsha |
Publisher | : Elsevier |
Total Pages | : 1173 |
Release | : 2005-12-16 |
Genre | : Technology & Engineering |
ISBN | : 0080480314 |
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The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
Author | : Donald L. Smith |
Publisher | : McGraw Hill Professional |
Total Pages | : 648 |
Release | : 1995-03-22 |
Genre | : Technology & Engineering |
ISBN | : 9780070585027 |
Download Thin-Film Deposition: Principles and Practice Book in PDF, Epub and Kindle
Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.
Author | : Daniel Dobkin |
Publisher | : Springer Science & Business Media |
Total Pages | : 298 |
Release | : 2003-04-30 |
Genre | : Technology & Engineering |
ISBN | : 9781402012488 |
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Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Author | : Hugh O. Pierson |
Publisher | : William Andrew |
Total Pages | : 507 |
Release | : 1999-09-01 |
Genre | : Technology & Engineering |
ISBN | : 0815517432 |
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Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
Author | : M. L. Hitchman |
Publisher | : Academic Press |
Total Pages | : 692 |
Release | : 1993-04-13 |
Genre | : Science |
ISBN | : |
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This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
Author | : Donald Leonard Smith |
Publisher | : McGraw-Hill Companies |
Total Pages | : 616 |
Release | : 1995 |
Genre | : Dispositivos de pelĂculas delgadas |
ISBN | : 9780071139137 |
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Author | : Hugh O. Pierson |
Publisher | : William Andrew |
Total Pages | : 458 |
Release | : 2012-12-02 |
Genre | : Technology & Engineering |
ISBN | : 1437744885 |
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Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Author | : Krishna Seshan |
Publisher | : CRC Press |
Total Pages | : 72 |
Release | : 2002-02-01 |
Genre | : Science |
ISBN | : 1482269686 |
Download Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon Book in PDF, Epub and Kindle
The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec
Author | : Joy George |
Publisher | : CRC Press |
Total Pages | : 394 |
Release | : 1992-02-26 |
Genre | : Technology & Engineering |
ISBN | : 9780849306518 |
Download Preparation of Thin Films Book in PDF, Epub and Kindle
"Preparation of Thin Films provides a comprehensive account of various deposition techniques for the preparation of thin films of elements, compounds, alloys, ceramics, and semiconductors - emphasizing inorganic compound thin films and discussing high vacuum and chemical deposition methods used for preparing high temperature superconducting oxide thin films. "
Author | : Klaus K. Schuegraf |
Publisher | : William Andrew |
Total Pages | : 440 |
Release | : 1988 |
Genre | : Technology & Engineering |
ISBN | : |
Download Handbook of Thin-film Deposition Processes and Techniques Book in PDF, Epub and Kindle
The most recent developments and techniques in thin film deposition for high technology applications are described by 23 authorities in the field.