Principles Of Chemical Vapor Deposition
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Author | : Daniel Dobkin |
Publisher | : Springer Science & Business Media |
Total Pages | : 298 |
Release | : 2003-04-30 |
Genre | : Technology & Engineering |
ISBN | : 9781402012488 |
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Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Author | : Hugh O. Pierson |
Publisher | : William Andrew |
Total Pages | : 507 |
Release | : 1999-09-01 |
Genre | : Technology & Engineering |
ISBN | : 0815517432 |
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Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
Author | : M. L. Hitchman |
Publisher | : Academic Press |
Total Pages | : 692 |
Release | : 1993-04-13 |
Genre | : Science |
ISBN | : |
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This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
Author | : Arthur Sherman |
Publisher | : William Andrew |
Total Pages | : 240 |
Release | : 1987 |
Genre | : Computers |
ISBN | : |
Download Chemical Vapor Deposition for Microelectronics Book in PDF, Epub and Kindle
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Author | : Professor K.S. K.S Sree Harsha |
Publisher | : Elsevier |
Total Pages | : 1173 |
Release | : 2005-12-16 |
Genre | : Technology & Engineering |
ISBN | : 0080480314 |
Download Principles of Vapor Deposition of Thin Films Book in PDF, Epub and Kindle
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
Author | : Xiu-Tian Yan |
Publisher | : Springer Science & Business Media |
Total Pages | : 352 |
Release | : 2010-03-23 |
Genre | : Technology & Engineering |
ISBN | : 1848828942 |
Download Chemical Vapour Deposition Book in PDF, Epub and Kindle
"Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" focuses on the application of this technology to engineering coatings and, in particular, to the manufacture of high performance materials, such as fibre reinforced ceramic composite materials, for structural applications at high temperatures. This book aims to provide a thorough exploration of the design and applications of advanced materials, and their manufacture in engineering. From physical fundamentals and principles, to optimization of processing parameters and other current practices, this book is designed to guide readers through the development of both high performance materials and the design of CVD systems to manufacture such materials. "Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" introduces integrated design and manufacture of advanced materials to researchers, industrial practitioners, postgraduates and senior undergraduate students.
Author | : Srinivasan Sivaram |
Publisher | : Springer Science & Business Media |
Total Pages | : 302 |
Release | : 2013-11-11 |
Genre | : Technology & Engineering |
ISBN | : 1475747519 |
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In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Author | : Jeffrey B. Fortin |
Publisher | : Springer Science & Business Media |
Total Pages | : 112 |
Release | : 2013-03-09 |
Genre | : Science |
ISBN | : 147573901X |
Download Chemical Vapor Deposition Polymerization Book in PDF, Epub and Kindle
Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.
Author | : Hirotsugu Yasuda |
Publisher | : CRC Press |
Total Pages | : 840 |
Release | : 2004-11-30 |
Genre | : Science |
ISBN | : 1420030299 |
Download Luminous Chemical Vapor Deposition and Interface Engineering Book in PDF, Epub and Kindle
Providing in-depth coverage of the technologies and various approaches, Luminous Chemical Vapor Deposition and Interface Engineering showcases the development and utilization of LCVD procedures in industrial scale applications. It offers a wide range of examples, case studies, and recommendations for clear understanding of this innovative science.
Author | : Edited by Jong-Hee Park and T.S. Sudarshan |
Publisher | : ASM International |
Total Pages | : 478 |
Release | : 2000-05-01 |
Genre | : Technology & Engineering |
ISBN | : |
Download Surface Engineering Series Volume 2: Chemical Vapor Deposition Book in PDF, Epub and Kindle
This handbook provides guidelines and practical information on the chemical vapor deposition (CVD) process for surface engineering design, product development, and manufacturing. The first of the 14 chapters discuss the basic principles of CVD thermodynamics and kinetics, stresses and mechanical sta