Plasma Process Technology Fundamentals
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Author | : M. Capitelli |
Publisher | : Springer Science & Business Media |
Total Pages | : 226 |
Release | : 2012-12-06 |
Genre | : Science |
ISBN | : 1461534003 |
Download Plasma Technology Book in PDF, Epub and Kindle
The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A.M. Ignatov and A.A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i, R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A
Author | : Stephen M. Rossnagel |
Publisher | : William Andrew |
Total Pages | : 523 |
Release | : 1990 |
Genre | : Reference |
ISBN | : 9780815512202 |
Download Handbook of Plasma Processing Technology Book in PDF, Epub and Kindle
This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.
Author | : M. Sugawara |
Publisher | : OUP Oxford |
Total Pages | : 362 |
Release | : 1998-05-28 |
Genre | : Technology & Engineering |
ISBN | : 0191590290 |
Download Plasma Etching Book in PDF, Epub and Kindle
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Author | : George J. Collins |
Publisher | : |
Total Pages | : 390 |
Release | : 1982 |
Genre | : Plasma (Ionized gases) |
ISBN | : |
Download Plasma Process Technology Fundamentals Book in PDF, Epub and Kindle
Author | : R.J. Shul |
Publisher | : Springer Science & Business Media |
Total Pages | : 664 |
Release | : 2011-06-28 |
Genre | : Technology & Engineering |
ISBN | : 3642569897 |
Download Handbook of Advanced Plasma Processing Techniques Book in PDF, Epub and Kindle
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Author | : National Research Council |
Publisher | : National Academies Press |
Total Pages | : 88 |
Release | : 1991-02-01 |
Genre | : Technology & Engineering |
ISBN | : 0309045975 |
Download Plasma Processing of Materials Book in PDF, Epub and Kindle
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Author | : Loucas G. Christophorou |
Publisher | : Springer Science & Business Media |
Total Pages | : 791 |
Release | : 2012-12-06 |
Genre | : Science |
ISBN | : 1441989714 |
Download Fundamental Electron Interactions with Plasma Processing Gases Book in PDF, Epub and Kindle
This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.
Author | : Arthur H Landrock |
Publisher | : William Andrew |
Total Pages | : 523 |
Release | : 1990 |
Genre | : |
ISBN | : |
Download Handbook of Plasma Processing Technology Book in PDF, Epub and Kindle
This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.
Author | : Paul Williams |
Publisher | : Springer Science & Business Media |
Total Pages | : 634 |
Release | : 1997-05-31 |
Genre | : Technology & Engineering |
ISBN | : 9780792345671 |
Download Plasma Processing of Semiconductors Book in PDF, Epub and Kindle
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Author | : Yoshinobu Kawai |
Publisher | : John Wiley & Sons |
Total Pages | : 467 |
Release | : 2010-04-26 |
Genre | : Technology & Engineering |
ISBN | : 3527325441 |
Download Industrial Plasma Technology Book in PDF, Epub and Kindle
Clearly structured in five major sections on applications, this monograph covers such hot technologies as nanotechnology, solar cell technology, biomedical and clinical applications, and sustainability. Since the topic, applications and readers are highly interdisciplinary, the book bridges materials science, industrial chemistry, physics, and engineering -- making it a must-have for researchers in industry and academia, as well as those working in application-oriented plasma technology.