Physics-based Modeling and Analysis of Nonclassical Nanoscale CMOS with Circuit Applications

Physics-based Modeling and Analysis of Nonclassical Nanoscale CMOS with Circuit Applications
Author: Weimin Zhang
Publisher:
Total Pages:
Release: 2006
Genre:
ISBN:

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A FinFET-based hybrid device, namely the inverted-T (IT) FET, is proposed for improving current drive per pitch by fabricating a single-gate fully-depleted (FD) SOI MOSFET in the unused portion of the pitch area. Physical insights regarding the design and performance of the ITFET are gained with the UFDG model in Spice3, combined with simulations done with the 3-D numerical simulator Davinci, with design goals to achieve good current-voltage characteristics, i.e., high Ion/pitch and high Ion/Ioff with acceptable V sub t. Its advantages in effecting a good design of a nanoscale SRAM cell and of a novel two-transistor floating-body memory cell (2TFBC) are proposed and analyzed.

Fundamentals of Ultra-Thin-Body MOSFETs and FinFETs

Fundamentals of Ultra-Thin-Body MOSFETs and FinFETs
Author: Jerry G. Fossum
Publisher: Cambridge University Press
Total Pages: 227
Release: 2013-08-29
Genre: Technology & Engineering
ISBN: 1107030412

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Understand the theory, design and applications of FD/SOI MOSFETs and 3-D FinFETs with this concise and clear guide to FD/UTB transistors. Topics covered include short-channel effects, quantum-mechanical effects, applications of UTB devices to floating-body DRAM and conventional SRAM, and nanoscale UTB CMOS performances.

Nonclassical Nanoscale CMOS: Performance Projections, Design Optimization, and Physical Modeling

Nonclassical Nanoscale CMOS: Performance Projections, Design Optimization, and Physical Modeling
Author: Seung-Hwan Kim
Publisher:
Total Pages: 167
Release: 2006
Genre:
ISBN: 9781109873559

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This dissertation addresses performance projections, design optimization, and physical modeling issues of nonclassical nanoscale CMOS devices with UTBs, assessing their potential to become the basis of the near-future mainstream semiconductor technology.

Nano-scale CMOS Analog Circuits

Nano-scale CMOS Analog Circuits
Author: Soumya Pandit
Publisher: CRC Press
Total Pages: 410
Release: 2018-09-03
Genre: Technology & Engineering
ISBN: 1351831992

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Reliability concerns and the limitations of process technology can sometimes restrict the innovation process involved in designing nano-scale analog circuits. The success of nano-scale analog circuit design requires repeat experimentation, correct analysis of the device physics, process technology, and adequate use of the knowledge database. Starting with the basics, Nano-Scale CMOS Analog Circuits: Models and CAD Techniques for High-Level Design introduces the essential fundamental concepts for designing analog circuits with optimal performances. This book explains the links between the physics and technology of scaled MOS transistors and the design and simulation of nano-scale analog circuits. It also explores the development of structured computer-aided design (CAD) techniques for architecture-level and circuit-level design of analog circuits. The book outlines the general trends of technology scaling with respect to device geometry, process parameters, and supply voltage. It describes models and optimization techniques, as well as the compact modeling of scaled MOS transistors for VLSI circuit simulation. • Includes two learning-based methods: the artificial neural network (ANN) and the least-squares support vector machine (LS-SVM) method • Provides case studies demonstrating the practical use of these two methods • Explores circuit sizing and specification translation tasks • Introduces the particle swarm optimization technique and provides examples of sizing analog circuits • Discusses the advanced effects of scaled MOS transistors like narrow width effects, and vertical and lateral channel engineering Nano-Scale CMOS Analog Circuits: Models and CAD Techniques for High-Level Design describes the models and CAD techniques, explores the physics of MOS transistors, and considers the design challenges involving statistical variations of process technology parameters and reliability constraints related to circuit design.

Nanoscale Field Effect Transistors: Emerging Applications

Nanoscale Field Effect Transistors: Emerging Applications
Author: Ekta Goel, Archana Pandey
Publisher: Bentham Science Publishers
Total Pages: 212
Release: 2023-12-20
Genre: Technology & Engineering
ISBN: 9815165658

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Nanoscale Field Effect Transistors: Emerging Applications is a comprehensive guide to understanding, simulating, and applying nanotechnology for design and development of specialized transistors. This book provides in-depth information on the modeling, simulation, characterization, and fabrication of semiconductor FET transistors. The book contents are structured into chapters that explain concepts with simple language and scientific references. The core of the book revolves around the fundamental physics that underlie the design of solid-state nanostructures and the optimization of these nanoscale devices for real-time applications. Readers will learn how to achieve superior performance in terms of reduced size and weight, enhanced subthreshold characteristics, improved switching efficiency, and minimal power consumption. Key Features: Quick summaries: Each chapter provides an introduction and summary to explain concepts in a concise manner. In-Depth Analysis: This book provides an extensive exploration of the theory and practice of nanoscale materials and devices, offering a detailed understanding of the technical aspects of Nano electronic FET transistors. Multidisciplinary Approach: It discusses various aspects of nanoscale materials and devices for applications such as quantum computation, biomedical applications, energy generation and storage, environmental protection, and more. It showcases how nanoscale FET devices are reshaping multiple industries. References: Chapters include references that encourage advanced readers to further explore key topics. Designed for a diverse audience, this book caters to students, academics and advanced readers interested in learning about Nano FET devices. Readership Students, academics and advanced readers

Compact Modeling

Compact Modeling
Author: Gennady Gildenblat
Publisher: Springer Science & Business Media
Total Pages: 531
Release: 2010-06-22
Genre: Technology & Engineering
ISBN: 9048186145

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Most of the recent texts on compact modeling are limited to a particular class of semiconductor devices and do not provide comprehensive coverage of the field. Having a single comprehensive reference for the compact models of most commonly used semiconductor devices (both active and passive) represents a significant advantage for the reader. Indeed, several kinds of semiconductor devices are routinely encountered in a single IC design or in a single modeling support group. Compact Modeling includes mostly the material that after several years of IC design applications has been found both theoretically sound and practically significant. Assigning the individual chapters to the groups responsible for the definitive work on the subject assures the highest possible degree of expertise on each of the covered models.

Nanoscale Memristor Device and Circuits Design

Nanoscale Memristor Device and Circuits Design
Author: Balwinder Raj
Publisher: Elsevier
Total Pages: 254
Release: 2023-11-20
Genre: Technology & Engineering
ISBN: 0323998119

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Nanoscale Memristor Device and Circuits Design provides theoretical frameworks, including (i) the background of memristors, (ii) physics of memristor and their modeling, (iii) menristive device applications, and (iv) circuit design for security and authentication. The book focuses on a broad aspect of realization of these applications as low cost and reliable devices. This is an important reference that will help materials scientists and engineers understand the production and applications of nanoscale memrister devices. A memristor is a two-terminal memory nanoscale device that stores information in terms of high/low resistance. It can retain information even when the power source is removed, i.e., "non-volatile." In contrast to MOS Transistors (MOST), which are the building blocks of all modern mobile and computing devices, memristors are relatively immune to radiation, as well as parasitic effects, such as capacitance, and can be much more reliable. This is extremely attractive for critical safety applications, such as nuclear and aerospace, where radiation can cause failure in MOST-based systems. Outlines the major principles of circuit design for nanoelectronic applications Explores major applications, including memristor-based memories, sensors, solar cells, or memristor-based hardware and software security applications Assesses the major challenges to manufacturing nanoscale memristor devices at an industrial scale

Nanoscale CMOS VLSI Circuits: Design for Manufacturability

Nanoscale CMOS VLSI Circuits: Design for Manufacturability
Author: Sandip Kundu
Publisher: McGraw Hill Professional
Total Pages: 316
Release: 2010-06-22
Genre: Technology & Engineering
ISBN: 0071635203

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Cutting-Edge CMOS VLSI Design for Manufacturability Techniques This detailed guide offers proven methods for optimizing circuit designs to increase the yield, reliability, and manufacturability of products and mitigate defects and failure. Covering the latest devices, technologies, and processes, Nanoscale CMOS VLSI Circuits: Design for Manufacturability focuses on delivering higher performance and lower power consumption. Costs, constraints, and computational efficiencies are also discussed in the practical resource. Nanoscale CMOS VLSI Circuits covers: Current trends in CMOS VLSI design Semiconductor manufacturing technologies Photolithography Process and device variability: analyses and modeling Manufacturing-Aware Physical Design Closure Metrology, manufacturing defects, and defect extraction Defect impact modeling and yield improvement techniques Physical design and reliability DFM tools and methodologies

Physical Modeling and Analysis of Carrier Confinement and Transport in Silicon-on-insulator and Double-gate CMOS Devices and Circuits

Physical Modeling and Analysis of Carrier Confinement and Transport in Silicon-on-insulator and Double-gate CMOS Devices and Circuits
Author: Lixin Ge
Publisher:
Total Pages:
Release: 2002
Genre: Metal oxide semiconductor field-effect transistors
ISBN:

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ABSTRACT: This dissertation mainly focuses on the development of a University of Florida generic process/physics-based compact model (UFDG) for complementary metal-oxide-semiconductor (CMOS) double-gate (DG) field-effect transistors (FETs), enabling predictive device/circuit simulations and analysis of extremely scaled DG CMOS. Further, updates and improvement of the University of Florida SOI (UFSOI) fully depleted (FD) and partially depleted (or non-fully depleted, NFD) MOSFET models are developed and applied to gain insight into the behavior of scaled SOI MOSFETs in integrated CMOS circuits. As the critical dimensions of MOSFETs shrink below 100 nm, Monte Carlo simulations of such devices show strong off-equilibrium transport effects such as velocity overshoot. A Boltzmann transport equation (BTE)-based analytical model for quasi-ballistic transport (i.e., velocity overshoot) was developed for scaled MOSFETs, and implemented in physics-based compact models (UFSOI/PD, UFSOI/FD, and UFDG), with verification and applications to extremely scaled devices. As the end of the Semiconductor Industry Association (SIA) roadmap is approached, DG MOSFETs, having thin Si-film bodies, will possibly constitute the mainstream CMOS technology due to their superior scalability.

Physics and Design of Nonclassical Nanoscale CMOS Devices with Ultra-thin Bodies

Physics and Design of Nonclassical Nanoscale CMOS Devices with Ultra-thin Bodies
Author: Vishal P. Trivedi
Publisher:
Total Pages:
Release: 2005
Genre: Metal oxide semiconductor field-effect transistors
ISBN:

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Thus, the impact of undoped body on the electrostatics of the generic DG MOSFET is examined. Carrier distribution in the body and in the quantized energy states is found to have profound effects in both weak and strong inversion. Quantum-mechanical (QM) effects, dependent on t sub Si, transverse electric field (epsilon sub x), and crystal orientation, are also physically modeled. With an undoped UTB, the need for gate-source/drain (G-S/D) underlap is emphasized as the gate length (L sub gate) approaches 7nm. L sub eff is related to L sub gate for designs with G-S/D underlap. Using numerical device simulations, physical insights on the bias dependence and the S/D lateral doping profile dependence of L sub eff are gained, relating the noted scalability in terms of L sub eff to L sub gate. The extrinsic S/D series resistance (R sub S/D) and the parasitic G-S/D capacitance (C sub GS/D) are also examined.