Preliminary Results of Low Energy Sputter Yields of Boron Nitride Due to Xenon Ion Bombardment (Preprint).

Preliminary Results of Low Energy Sputter Yields of Boron Nitride Due to Xenon Ion Bombardment (Preprint).
Author:
Publisher:
Total Pages: 61
Release: 2008
Genre:
ISBN:

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We describe the development of an experimental apparatus geared towards measurement of boron nitride sputtering by low energy ions. A four-grid system is used to achieve a collimated beam at low energy (

Total and Differential Sputter Yields of Boron Nitride Measured by Quartz Crystal Microbalance (Preprint).

Total and Differential Sputter Yields of Boron Nitride Measured by Quartz Crystal Microbalance (Preprint).
Author:
Publisher:
Total Pages: 19
Release: 2009
Genre:
ISBN:

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We present differential sputter yield measurements of boron nitride due to bombardment by xenon ions. A four-grid ion optics system is used to achieve a collimated ion beam at low energy (

Differential Sputter Yields of Boron Nitride, Quartz, and Kapton Due to Low Energy Xe+ Bombardment (Preprint).

Differential Sputter Yields of Boron Nitride, Quartz, and Kapton Due to Low Energy Xe+ Bombardment (Preprint).
Author: A. P. Yalin
Publisher:
Total Pages: 16
Release: 2007
Genre:
ISBN:

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In this contribution we present results of differential sputter yield measurements of boron nitride, quartz, and kapton due to bombardment by xenon ions. The measurements are made using a sputtering diagnostic based on a quartz crystal microbalance (QCM). The QCM measurement allows full angular resolution, i.e. differential sputtering yield measurements are measured as a function of both polar angle and azimuthal angle. Measured profiles are presented for 100, 250, 350 and 500 eV Xe+ bombardment at 0?, 15?, 30? and 45? angles of incidence. We fit the measured profiles with Modified Zhang expressions using two free parameters: the total sputter yield, Y, and characteristic energy E*. Total yields are calculated from the differential profiles and are compared with published values and weight loss values where possible.

Synthesis and Properties of Boron Nitride

Synthesis and Properties of Boron Nitride
Author: J.J. Pouch
Publisher: Trans Tech Publications Ltd
Total Pages: 426
Release: 1991-01-01
Genre: Technology & Engineering
ISBN: 3035704511

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Boron nitride thin films can be deposited on different substrates using techniques such as plasma deposition, ion beam deposition and reactive sputter deposition.

Nuclear Science Abstracts

Nuclear Science Abstracts
Author:
Publisher:
Total Pages: 612
Release: 1976
Genre: Nuclear energy
ISBN:

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Boron Nitride Nanomaterials

Boron Nitride Nanomaterials
Author: Ben McLean
Publisher: CRC Press
Total Pages: 226
Release: 2022-12-23
Genre: Science
ISBN: 1000636674

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Boron nitride was first produced in the 18th century and, by virtue of its extraordinary mechanical strength, has found extensive application in industrial processes since the 1940s. However, the more recent discovery that boron nitride allotropes are as structurally diverse as those of carbon (e.g. fullerenes, graphene, carbon nanotubes) has placed this material, and particularly its low-dimensional allotropes, back at the forefront of modern material science. This book provides a comprehensive history of this rapid rise in the status of boron nitride and boron nitride nanomaterials, spanning the earliest examples of three-dimensional boron nitride allotropes, through to contemporary structures such as monolayer hexagonal boron nitride, boron nitride nanomeshes, boron nitride nanotubes and the incorporation of boron nitride into cutting-edge van der Waals heterostructures. It specifically focuses on the properties, applications and synthesis techniques for each of these allotropes and examines how the evolution in boron nitride production methods is linked to that in our understanding of how low-dimensional nanomaterials self-assemble, or ‘grow’, during synthesis. The book demonstrates the key synergy between growth mechanisms and the development of new, advanced nanostructured materials.