Download Low Dielectric Constant Thin Film High Frequency Characterization Technique full books in PDF, epub, and Kindle. Read online free Low Dielectric Constant Thin Film High Frequency Characterization Technique ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
| Author | : Ge Song |
| Publisher | : |
| Total Pages | : 374 |
| Release | : 2001 |
| Genre | : |
| ISBN | : |
| Author | : R. Scott Cochrane |
| Publisher | : |
| Total Pages | : 115 |
| Release | : 1993 |
| Genre | : |
| ISBN | : |
| Author | : Hari Singh Nalwa |
| Publisher | : Elsevier |
| Total Pages | : 3451 |
| Release | : 2001-11-17 |
| Genre | : Technology & Engineering |
| ISBN | : 0080533248 |
This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures. Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.
| Author | : Mahbub Hasan |
| Publisher | : |
| Total Pages | : 148 |
| Release | : 1999 |
| Genre | : Ferroelectric thin films |
| ISBN | : |
| Author | : Hari Singh Nalwa |
| Publisher | : Academic Press |
| Total Pages | : 661 |
| Release | : 2001-10-29 |
| Genre | : Science |
| ISBN | : 0125129084 |
This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures. Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.
| Author | : Klaus Wetzig |
| Publisher | : John Wiley & Sons |
| Total Pages | : 388 |
| Release | : 2006-03-06 |
| Genre | : Science |
| ISBN | : 3527606475 |
This up-to-date handbook covers the main topics of preparation, characterization and properties of complex metal-based layer systems. The authors -- an outstanding group of researchers -- discuss advanced methods for structure, chemical and electronic state characterization with reference to the properties of thin functional layers, such as metallization and barrier layers for microelectronics, magnetoresistive layers for GMR and TMR, sensor and resistance layers. As such, the book addresses materials specialists in industry, especially in microelectronics, as well as scientists, and can also be recommended for advanced studies in materials science, analytics, surface and solid state science.
| Author | : Ramasamy Ravindran |
| Publisher | : |
| Total Pages | : |
| Release | : 2006 |
| Genre | : Dielectrics |
| ISBN | : |
As integrated circuit (IC) devices scale to ever smaller nodes, replacing the front end dielectric has become a primary challenge. To enable greater device densities, control power consumption, and enhance performance, a new class of insulators with large dielectric constants (high-[kappa]) will need to be employed as a replacement for oxides and oxynitrides of silicon. A variety of semiconductor devices ranging from metal oxide semiconductor field effect transistors to flash and dynamic random access memories stand to benefit from new high-[kappa] dielectric thin-films. In addition, compact capacitors using high-[kappa] dielectrics can enable high density on-chip energy storage. Compounds of HfO2 and Al2O3 are among the leading high-[kappa] candidates. There is also potential in incorporating nanoparticles into an insulating medium to enhance its dielectric constant. Previously, the use of nanoparticles for this purpose has typically been performed using techniques and materials that cannot be readily incorporated into modern IC fabrication. This thesis presents the results of work on reactive electron beam evaporated Al2O3 and HfO2 thin-films, the incorporation of nanoparticles, and the characterization of these films on silicon substrates.
| Author | : Jain Pushkar |
| Publisher | : Springer Science & Business Media |
| Total Pages | : 164 |
| Release | : 2011-06-27 |
| Genre | : Technology & Engineering |
| ISBN | : 1441991441 |
Thin-Film Capacitors for Packaged Electronics deals with the capacitors of a wanted kind, still needed and capable of keeping pace with the demands posed by ever greater levels of integration. It spans a wide range of topics, from materials properties to limits of what's the best one can achieve in capacitor properties to process modeling to application examples. Some of the topics covered are the following: -Novel insights into fundamental relationships between dielectric constant and the breakdown field of materials and related capacitance density and breakdown voltage of capacitor structures, -Electrical characterization techniques for a wide range of frequencies (1 kHz to 20 GHz), -Process modeling to determine stable operating points, -Prevention of metal (Cu) diffusion into the dielectric, -Measurements and modeling of the dielectric micro-roughness.
| Author | : Ram Ekwal Sah |
| Publisher | : The Electrochemical Society |
| Total Pages | : 863 |
| Release | : 2007 |
| Genre | : Dielectric films |
| ISBN | : 1566775523 |
This issue of ECS Transactions contains the papers presented in the symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectics held May 6-11, 2007 in Chicago. Papers were presented on deposition, characterization and applications of the dielectrics including high- and low-k dielectrics, as well as interface states, device characterization, reliabiliy and modeling.
