LEOS '89, Lasers and Electro-Optics Society Annual Meeting
Author | : |
Publisher | : |
Total Pages | : 508 |
Release | : 1988 |
Genre | : Electrooptics |
ISBN | : |
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Author | : |
Publisher | : |
Total Pages | : 508 |
Release | : 1988 |
Genre | : Electrooptics |
ISBN | : |
Author | : |
Publisher | : |
Total Pages | : 512 |
Release | : 1989 |
Genre | : Electrooptics |
ISBN | : |
Author | : Klaus Krippendorff |
Publisher | : Routledge |
Total Pages | : 173 |
Release | : 2020-01-20 |
Genre | : Social Science |
ISBN | : 1000026078 |
This interdisciplinary collection brings together leading and emerging scholars of discourse, conceptualizing how discursive practices shape social, political, and even material realities today. Discourses in Action presents a wide range of essays that explore fundamental concerns for the social consequences of text, talk, and discursively informed actions and possibilities of discursive engagement. It opens new perspectives on what language does and the differences that scholarly and practical contributions can make. Chapters cover diverse topics, ranging from political struggles, climate change, social revolutions, ethnicity, violence and other often unexpected patterns of discursive consequences. Its essays also explore the cultural contingencies that underlie discourse practices which are usually ignored when analysed from within a taken-for-granted culture. Providing a useful examination of current discourse studies, this interdisciplinary volume is ideal for students and researchers within media, communication, discourse analysis, linguistics, cultural studies, and the sociology of knowledge.
Author | : Philippines |
Publisher | : |
Total Pages | : 466 |
Release | : 2003 |
Genre | : Law |
ISBN | : |
Author | : R.J. Shul |
Publisher | : Springer Science & Business Media |
Total Pages | : 664 |
Release | : 2011-06-28 |
Genre | : Technology & Engineering |
ISBN | : 3642569897 |
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.