Fundamental Aspects of Plasma Chemical Physics

Fundamental Aspects of Plasma Chemical Physics
Author: Mario Capitelli
Publisher: Springer Science & Business Media
Total Pages: 318
Release: 2015-11-26
Genre: Science
ISBN: 1441981853

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Describing non-equilibrium "cold" plasmas through a chemical physics approach, this book uses the state-to-state plasma kinetics, which considers each internal state as a new species with its own cross sections. Extended atomic and molecular master equations are coupled with Boltzmann and Monte Carlo methods to solve the electron energy distribution function. Selected examples in different applied fields, such as microelectronics, fusion, and aerospace, are presented and discussed including the self-consistent kinetics in RF parallel plate reactors, the optimization of negative ion sources and the expansion of high enthalpy flows through nozzles of different geometries. The book will cover the main aspects of the state-to-state kinetic approach for the description of nonequilibrium cold plasmas, illustrating the more recent achievements in the development of kinetic models including the self-consistent coupling of master equations and Boltzmann equation for electron dynamics. To give a complete portrayal, the book will assess fundamental concepts and theoretical formulations, based on a unified methodological approach, and explore the insight in related scientific problems still opened for the research community.

Fundamental Aspects of Plasma Chemical Physics

Fundamental Aspects of Plasma Chemical Physics
Author: Mario Capitelli
Publisher: Springer Science & Business Media
Total Pages: 365
Release: 2013-04-02
Genre: Science
ISBN: 1441981721

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Fundamental Aspects of Plasma Chemical Physics: Transport develops basic and advanced concepts of plasma transport to the modern treatment of the Chapman-Enskog method for the solution of the Boltzmann transport equation. The book invites the reader to consider actual problems of the transport of thermal plasmas with particular attention to the derivation of diffusion- and viscosity-type transport cross sections, stressing the role of resonant charge-exchange processes in affecting the diffusion-type collision calculation of viscosity-type collision integrals. A wide range of topics is then discussed including (1) the effect of non-equilibrium vibrational distributions on the transport of vibrational energy, (2) the role of electronically excited states in the transport properties of thermal plasmas, (3) the dependence of transport properties on the multitude of Saha equations for multi-temperature plasmas, and (4) the effect of the magnetic field on transport properties. Throughout the book, worked examples are provided to clarify concepts and mathematical approaches. This book is the second of a series of three published by the Bari group on fundamental aspects of plasma chemical physics. The first book, Fundamental Aspects of Plasma Chemical Physics: Thermodynamics, is dedicated to plasma thermodynamics; and the third, Fundamental Aspects of Plasma Chemical Physics: Kinetics, deals with plasma kinetics.

Fundamental Aspects of Plasma Chemical Physics

Fundamental Aspects of Plasma Chemical Physics
Author: Mario Capitelli
Publisher: Springer Science & Business Media
Total Pages: 318
Release: 2011-12-02
Genre: Science
ISBN: 1441981829

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Fundamental Aspects of Plasma Chemical Physics - Thermodynamics develops basic and advanced concepts of plasma thermodynamics from both classical and statistical points of view. After a refreshment of classical thermodynamics applied to the dissociation and ionization regimes, the book invites the reader to discover the role of electronic excitation in affecting the properties of plasmas, a topic often overlooked by the thermal plasma community. Particular attention is devoted to the problem of the divergence of the partition function of atomic species and the state-to-state approach for calculating the partition function of diatomic and polyatomic molecules. The limit of ideal gas approximation is also discussed, by introducing Debye-Huckel and virial corrections. Throughout the book, worked examples are given in order to clarify concepts and mathematical approaches. This book is a first of a series of three books to be published by the authors on fundamental aspects of plasma chemical physics. The next books will discuss transport and kinetics.

Fundamentals of Plasma Physics

Fundamentals of Plasma Physics
Author: J. A. Bittencourt
Publisher: Elsevier
Total Pages: 730
Release: 2013-10-22
Genre: Science
ISBN: 148329319X

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A general introduction designed to present a comprehensive, logical and unified treatment of the fundamentals of plasma physics based on statistical kinetic theory. Its clarity and completeness make it suitable for self-learning and self-paced courses. Problems are included.

Plasma Chemistry

Plasma Chemistry
Author: Alexander Fridman
Publisher: Cambridge University Press
Total Pages:
Release: 2008-05-05
Genre: Technology & Engineering
ISBN: 1139471732

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Providing a fundamental introduction to all aspects of modern plasma chemistry, this book describes mechanisms and kinetics of chemical processes in plasma, plasma statistics, thermodynamics, fluid mechanics and electrodynamics, as well as all major electric discharges applied in plasma chemistry. Fridman considers most of the major applications of plasma chemistry, from electronics to thermal coatings, from treatment of polymers to fuel conversion and hydrogen production and from plasma metallurgy to plasma medicine. It is helpful to engineers, scientists and students interested in plasma physics, plasma chemistry, plasma engineering and combustion, as well as chemical physics, lasers, energy systems and environmental control. The book contains an extensive database on plasma kinetics and thermodynamics and numerical formulas for practical calculations related to specific plasma-chemical processes and applications. Problems and concept questions are provided, helpful in courses related to plasma, lasers, combustion, chemical kinetics, statistics and thermodynamics, and high-temperature and high-energy fluid mechanics.

Nonthermal Plasma Chemistry and Physics

Nonthermal Plasma Chemistry and Physics
Author: Jurgen Meichsner
Publisher: CRC Press
Total Pages: 554
Release: 2012-11-13
Genre: Science
ISBN: 1420059211

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In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant

Plasma Physics and Engineering

Plasma Physics and Engineering
Author: Alexander Fridman
Publisher: CRC Press
Total Pages: 888
Release: 2004-04-15
Genre: Science
ISBN: 9781560328483

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Plasma engineering is a rapidly expanding area of science and technology with increasing numbers of engineers using plasma processes over a wide range of applications. An essential tool for understanding this dynamic field, Plasma Physics and Engineering provides a clear, fundamental introduction to virtually all aspects of modern plasma science and technology, including plasma chemistry and engineering, combustion, chemical physics, lasers, electronics, methods of material treatment, fuel conversion, and environmental control. The book contains an extensive database on plasma kinetics and thermodynamics, many helpful numerical formulas for practical calculations, and an array of problems and concept questions.

Thermal Plasmas

Thermal Plasmas
Author: M.I. Boulos
Publisher: Springer Science & Business Media
Total Pages: 462
Release: 2013-06-29
Genre: Science
ISBN: 1489913378

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In this unique textbook and reference source, the authors integrate theoretical and applied research from a host of disciplines, including materials science, plasma physics, and advanced transport phenomena. Volume 1, the first of two, covers the fundamentals of plasma physics and gaseous electronics, thermodynamics, and transport properties of plasma.

Plasma Technology

Plasma Technology
Author: M. Capitelli
Publisher: Springer Science & Business Media
Total Pages: 226
Release: 2012-12-06
Genre: Science
ISBN: 1461534003

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The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A.M. Ignatov and A.A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i, R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A