Functional Oxide Thin Films for Micromechanical and Bioelectronic Devices

Functional Oxide Thin Films for Micromechanical and Bioelectronic Devices
Author: Maximilian Becker
Publisher:
Total Pages: 0
Release: 2021
Genre:
ISBN:

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The present cumulative thesis discusses the challenging and exciting way to utilize the outstanding physical properties of functional oxide materials for the development of new applications and devices, with a focus on the integration of lead-free ferroelectric thin films into bioelectronics. The cumulative thesis comprises four publications - Publication I - IV - and is organized as follows. The first part (Publication I + II) is devoted to the pulsed laser deposition (PLD) of lead-free 0.5(Ba0:7Ca0:3)TiO3-0.5Ba(Zr0:2Ti0:8)O3 (BCZT) ferroelectric thin films on different substrates and their detailed electrical characterization and analysis by impedance spectroscopy. For the deconvolution of measured impedance spectra by equivalent-circuit fitting, a new equivalentcircuit element based on the theory of interface pinning in random systems - the domain wall pinning element - is introduced which models the impedance of a ferroelectric including the contribution from domain-wall-motion in the subswitching regime. This approach is applied to impedance spectra collected on polycrystalline and epitaxial BCZT thin film capacitor stacks, and the domain-wall-motion induced field- and frequency-dependent dielectric response of the BCZT films is extracted by domain wall pinning element modeling and equivalent-circuit fitting. Moreover, an extended Rayleigh analysis is presented which allows one to quantify the coupling strength between dielectric nonlinearity and frequency dispersion and the identification of different domain-wall-motion regimes in the BCZT films. The corresponding domain-wall dynamics in the BCZT thin films is discussed in detail and a schematic diagram of the different domain-wall-motion regimes is presented. The results from the extended Rayleigh analysis - obtained on epitaxial and polycrystalline BCZT films - indicate, that the presence of grain boundaries in BCZT reduces the coupling strength between dielectric nonlinearity and frequency dispersion and suppresses the motion of internal domain-wall segments in addition to the suppression of the irreversible center-of-mass motion of the domain walls. In the second part (Publication III), microelectrodes based on conductive sputtered IrO2 films (SIROFs) - which are utilized to provide electro-neural interfaces for subretinal stimulation in the state-of-the-art retinal prosthesis “Retina Implant Alpha AMS” - are analyzed in detail by electrochemical impedance spectroscopy (EIS) and subsequent equivalent-circuit analysis. The supercapacitive behavior of the investigated SIROF-microelectrodes is modeled by a pseudocapacitance Cp in parallel to the capacitance of the electrochemical double layer CDL, and both capacitances are represented by a constant phase element (CPE) in the equivalent-circuit model. By fitting the measured EIS data with the equivalent-circuit model, Cp and CDL are quantified from the obtained CPE fit parameters, and the resulting supercapacitive behavior is in agreement with cyclic voltammetry measurements. The results indicate, that the pseudocapacitance Cp due to quasi-continuous reversible reduction and oxidation between Ir3+/ Ir4+ valence states is the dominant contribution to the supercapacitance and to the charge injection capacity (CIC) of the investigated SIROF-microelectrodes. Finally, in the third part (Publication IV), a new approach for bioelectronic interfacing of electrogenic cells or tissue is introduced, which utilizes a conductive microelectrode coated with an insulating ferroelectric layer for extracellular electrical stimulation. It is shown, that the ferroelectric polarization current contributes to the extracellular stimulation current provided by the ferroelectric microelectrode. The switching regime of a ferroelectric microelectrode in an electrolyte-ferroelectric-conductor configuration is analyzed based on the traditional Kolmogorov-Avrami-Ishibashi (KAI)-model and the time-dependent stimulation current in response to an applied voltage step is simulated for a generic microelectrode geometry. It is shown that, depending on the remanent polarization Pr of the utilized ferroelectric, the polarization current in the switching regime can increase the CIC by up to two orders of magnitude as compared to the commonly used extracellular capacitive stimulation with microelectrodes coated with an insulating dielectric layer. The results pave the way for extracellular electrical stimulation with small microelectrodes (30 um in diameter) without toxic electrochemical effects, which is crucial for implantable neuroprosthetic devices such as high-resolution retinal-implants or brain-machine interfaces.

Thin Films and Heterostructures for Oxide Electronics

Thin Films and Heterostructures for Oxide Electronics
Author: Satishchandra B. Ogale
Publisher: Springer Science & Business Media
Total Pages: 416
Release: 2005-11-21
Genre: Technology & Engineering
ISBN: 0387260897

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Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physics etc. The aim of this book is to demonstrate the interplay of these fields and to provide an introduction to the techniques and methodologies involving film growth, characterization and device processing. The literature in this field is thus fairly scattered in different research journals covering one or the other aspect of the specific activity. This situation calls for a book that will consolidate this information and thus enable a beginner as well as an expert to get an overall perspective of the field, its foundations, and its projected progress.

Functional Oxide Based Thin-Film Materials

Functional Oxide Based Thin-Film Materials
Author: Dong-Sing Wuu
Publisher: MDPI
Total Pages: 160
Release: 2020-05-29
Genre: Science
ISBN: 3039288377

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This Special Issue on Functional Oxide-Based Thin-Film Materials touches on the latest advancements in several aspects related to material science: the synthesis of novel oxide, photoluminescence characteristics, photocatalytic ability, energy storage, light emitter studies, low-emissivity glass coatings, and investigations of both nanostructure and thin-film properties. It represents an amalgamation of specialists working with device applications and shedding light on the properties and behavior of thin-film oxides (e.g., GaOx, Ga2O3, HfO2, LiNbO3, and doped ZnO, among numerous others). The papers cover many aspects of thin-film science and technology, from thin film to nanostructure and from material properties to optoelectronic applications, thus reflecting the many interests of the community of scientists active in the field.

Thin Film Metal-Oxides

Thin Film Metal-Oxides
Author: Shriram Ramanathan
Publisher: Springer Science & Business Media
Total Pages: 344
Release: 2009-12-03
Genre: Technology & Engineering
ISBN: 1441906649

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Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.

Thin Films and Heterostructures for Oxide Electronics

Thin Films and Heterostructures for Oxide Electronics
Author: Satishchandra B. Ogale
Publisher: Springer
Total Pages: 0
Release: 2008-11-01
Genre: Technology & Engineering
ISBN: 9780387507057

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Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physics etc. The aim of this book is to demonstrate the interplay of these fields and to provide an introduction to the techniques and methodologies involving film growth, characterization and device processing. The literature in this field is thus fairly scattered in different research journals covering one or the other aspect of the specific activity. This situation calls for a book that will consolidate this information and thus enable a beginner as well as an expert to get an overall perspective of the field, its foundations, and its projected progress.

Chemical Solution Deposition of Functional Oxide Thin Films

Chemical Solution Deposition of Functional Oxide Thin Films
Author: Theodor Schneller
Publisher: Springer Science & Business Media
Total Pages: 801
Release: 2014-01-24
Genre: Technology & Engineering
ISBN: 3211993118

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This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.

Thin Film Metal-Oxides

Thin Film Metal-Oxides
Author: Shriram Ramanathan
Publisher: Springer
Total Pages: 337
Release: 2010-05-03
Genre: Technology & Engineering
ISBN: 9781441906656

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Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.

Metal Oxide-Based Thin Film Structures

Metal Oxide-Based Thin Film Structures
Author: Nini Pryds
Publisher: Elsevier
Total Pages: 562
Release: 2017-09-07
Genre: Technology & Engineering
ISBN: 0081017529

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Metal Oxide-Based Thin Film Structures: Formation, Characterization and Application of Interface-Based Phenomena bridges the gap between thin film deposition and device development by exploring the synthesis, properties and applications of thin film interfaces. Part I deals with theoretical and experimental aspects of epitaxial growth, the structure and morphology of oxide-metal interfaces deposited with different deposition techniques and new developments in growth methods. Part II concerns analysis techniques for the electrical, optical, magnetic and structural properties of thin film interfaces. In Part III, the emphasis is on ionic and electronic transport at the interfaces of Metal-oxide thin films. Part IV discusses methods for tailoring metal oxide thin film interfaces for specific applications, including microelectronics, communication, optical electronics, catalysis, and energy generation and conservation. This book is an essential resource for anyone seeking to further their knowledge of metal oxide thin films and interfaces, including scientists and engineers working on electronic devices and energy systems and those engaged in research into electronic materials. Introduces the theoretical and experimental aspects of epitaxial growth for the benefit of readers new to the field Explores state-of-the-art analysis techniques and their application to interface properties in order to give a fuller understanding of the relationship between macroscopic properties and atomic-scale manipulation Discusses techniques for tailoring thin film interfaces for specific applications, including information, electronics and energy technologies, making this book essential reading for materials scientists and engineers alike

Integration of Functional Oxides with Semiconductors

Integration of Functional Oxides with Semiconductors
Author: Alexander A. Demkov
Publisher: Springer Science & Business Media
Total Pages: 284
Release: 2014-02-20
Genre: Technology & Engineering
ISBN: 146149320X

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This book describes the basic physical principles of the oxide/semiconductor epitaxy and offers a view of the current state of the field. It shows how this technology enables large-scale integration of oxide electronic and photonic devices and describes possible hybrid semiconductor/oxide systems. The book incorporates both theoretical and experimental advances to explore the heteroepitaxy of tuned functional oxides and semiconductors to identify material, device and characterization challenges and to present the incredible potential in the realization of multifunctional devices and monolithic integration of materials and devices. Intended for a multidisciplined audience, Integration of Functional Oxides with Semiconductors describes processing techniques that enable atomic-level control of stoichiometry and structure and reviews characterization techniques for films, interfaces and device performance parameters. Fundamental challenges involved in joining covalent and ionic systems, chemical interactions at interfaces, multi-element materials that are sensitive to atomic-level compositional and structural changes are discussed in the context of the latest literature. Magnetic, ferroelectric and piezoelectric materials and the coupling between them will also be discussed. GaN, SiC, Si, GaAs and Ge semiconductors are covered within the context of optimizing next-generation device performance for monolithic device processing.