Controlling Chemical Modification of Chlorinated Silicon Surfaces Via Wet-chemistry Approaches and Morphology-preserving Functionalization of Metal Oxide Nanomaterials Through Two-step Click Reaction

Controlling Chemical Modification of Chlorinated Silicon Surfaces Via Wet-chemistry Approaches and Morphology-preserving Functionalization of Metal Oxide Nanomaterials Through Two-step Click Reaction
Author: Chuan He
Publisher:
Total Pages: 174
Release: 2020
Genre:
ISBN:

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Functionalization of semiconductor surfaces has a wide range of applications in numerous fields including sensing, catalysis, photo-electro chemistry, and energy conversion. The controlled and tunable covalent bonding is required to introduce designated functionality onto the surfaces bringing unique physical and chemical properties for the specific applications. Therefore, developing novel functionalization approaches is always necessary to make the controlled and tunable functionalization of semiconductor surfaces attainable as well as to achieve better understanding of the bonding processes and reaction mechanisms.

Surface Chemical Functionalization of Oxide-free Si(111) Surfaces and Silicon Nitride

Surface Chemical Functionalization of Oxide-free Si(111) Surfaces and Silicon Nitride
Author: Tatiana Peixoto Chopra
Publisher:
Total Pages: 448
Release: 2015
Genre: Amination
ISBN:

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Amination of surfaces is useful in a variety of fields, ranging from device manufacturing to biological applications. Previous silicon amination studies have concentrated on the ammonia vapor dissociation on silicon surfaces, with considerably less work done using liquid phase ammonia. Bifunctional molecules such as diamines are particularly attractive for surface amination since they can form different surface structures. In contrast to ammonia modification of silicon surfaces, direct grafting of diamine molecules to silicon is almost nonexistent in literature. Therefore in this dissertation, the study of amination of silicon surfaces using liquid phase ammonia and diamine reactions will be done. The approach used to study these complex liquid systems involves a systematic set of well-defined surfaces (oxide-free H-, 1/3 monolayer (ML) F- and Cl-terminated Si(111)), chosen for their atomic roughness and single reaction site. This systematic set is instrumental for achieving our goal of fundamentally understanding the reaction mechanisms and surface reactions in liquid phase. Results show that amines and diamines physisorb on the H-terminated Si(111) surface and chemisorb on the 1/3 ML F- and Cl-terminated surfaces, with full removal of the chlorine observed. Both studies showed evidence of oxidation or oxynitride formation, and surprisingly, Si-H bond formation on the previously hydrogen-free Cl-terminated Si(111) surface, which is attributed to a step edge reaction in the case of ammonia and a chlorine-proton exchange in the case of ethylenediamine. On stoichiometric silicon nitride surfaces, we find that HF etching leads to etchant salt formation if not immediately water rinsed. A salt-free HF-etched silicon nitride surface contained coverages of various terminations including: ~70% ML fluorine, ~40% ML hydroxide and ~20% ML amine. Selective functionalization of silicon nitride over oxide surfaces was achieved by using a Schiff base reaction, involving the conversion of the amine surface groups to imines using undecanal. These results illustrate the need and relevance of in-situ characterization to fully exploit semiconductor and oxide surfaces. A better understanding of the surface reaction mechanisms can provide the scientific community a deeper understanding of the reaction outcomes on these different surfaces, and in the future could aid in the development of silicon surface modifications.

Surface Treatments for Biological, Chemical and Physical Applications

Surface Treatments for Biological, Chemical and Physical Applications
Author: Mehmet Gürsoy
Publisher: John Wiley & Sons
Total Pages: 386
Release: 2016-11-14
Genre: Technology & Engineering
ISBN: 3527698825

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A step-by-step guide to the topic with a mix of theory and practice in the fields of biology, chemistry and physics. Straightforward and well-structured, the first chapter introduces fundamental aspects of surface treatments, after which examples from nature are given. Subsequent chapters discuss various methods to surface modification, including chemical and physical approaches, followed by the characterization of the functionalized surfaces. Applications discussed include the lotus effect, diffusion barriers, enzyme immobilization and catalysis. Finally, the book concludes with a look at future technology advances. Throughout the text, tutorials and case studies are used for training purposes to grant a deeper understanding of the topic, resulting in an essential reference for students as well as for experienced engineers in R&D.

Tuning Surface Chemistry and Nanostructure in Porous Silicon for Molecular Separation, Detection and Delivery

Tuning Surface Chemistry and Nanostructure in Porous Silicon for Molecular Separation, Detection and Delivery
Author: Chia-Chen Wu
Publisher:
Total Pages: 21
Release: 2013
Genre:
ISBN: 9781303527197

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Mesoporous materials with engineered surface properties are of interest for molecular separations, catalysis, drug delivery, and chemical sensing. One of the longstanding chemical challenges in the engineering of nanomaterials is to control the placement of different chemistries in spatially distinct regions on a nanoscale object. This thesis focuses on discovering and understanding processes to prepare such spatially differentiated chemistries on porous silicon. For the porous silicon system, the ability to prepare pores of average diameter anywhere from 1 to 200 nm allows the harnessing of surface tension and capillary forces to promote or obstruct the infiltration of reagent for selective modification. The first process investigated involves placing different chemistries on the pore walls by means of microdroplet patterning. In this method, a chemical resist is drop-coated on a porous silicon sample to mask distinct regions across the plane of the chip for subsequent chemical modification. Two chemistries, silicon oxide and silicon-methyl, are demonstrated here. The differential partitioning of test molecules on the resulting hydrophilic/hydrophobic film is achieved by simultaneous optical reflectance measurement of both regions, where the reflectance spectrum contains a convolution of the Fabry-Pérot interference spectrum for both types of surface chemistries. A second approach to engineer porous Si nanostructures that is investigated uses a hydrophobic organic liquid as a chemical resist; it is infiltrated into the pores to mask the interior of the porous silicon film, while the exterior surface and the pore mouths of the film are subjected to an aqueous chemical reaction with HF and subsequent chemical modification by thermal hydrosilylation. When chemically modified with a hydrophobic dodecyl species, the resulting film has a hydrophilic interior and a hydrophobic outer surface. The ability of these core-shell porous nanostructures to admit and release small molecules is assessed and exploited. The last portion of the thesis focuses on an evaluation of chemically modified porous silicon particles as oral drug delivery material, with an emphasis on the ability of the interior of the porous silicon nanostructure to protect physiologically unstable drugs. Partially oxidized porous silicon particles show no toxicity to nematodes at particle concentration up to 1 mg/mL in culture media. In vitro experiments show the particles protect anthelmintic protein-based drug Cry5B from hydrolytic degradation in simulated gastric fluid, and the bioactivity against nematodes is maintained. However, much reduced bioactivity of the therapeutic particles is observed In vivo on hookworm-infected hamsters. The lack of effectiveness in treating the disease In vivo is attributed to the short residence time of the particles in the gut of the animals.

Covalent Surface Modification of Silicon Oxides

Covalent Surface Modification of Silicon Oxides
Author: Austin Woohyuk Lee
Publisher:
Total Pages: 164
Release: 2017
Genre:
ISBN:

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Microwave radiation was utilized as a tool to modify surface properties of silicon oxides. Covalent surface modification of silicon oxides has been widely pursued in the areas of material science, electronics, microfluidics, biology, and separation science. Chemical surface modifications are often achieved through the formation of organic monolayers, often referred to as self-assembled monolayers (SAMs). While these organic monolayers have been proposed as an effective surface modification strategy, the defects in these organic monolayers compromise the effectiveness on their ability to alter surface properties. For example, in the case of passivation of microscale electronic devices, the surfaces that are not covered by the organic monolayers are susceptible to environmental stress or corrosion, which can cause detrimental failures of the devices. Traditional methods of formation of monolayers often cause many defects including formation of multilayers or micelles, physically adsorbed organic film, and/or voids. In this thesis, microwave radiation is utilized as a tool to accelerate the formation of uniform monolayers. In particular, the formation of silane based monolayers and alcohol based monolayers on silicon oxide surfaces have been extensively studied. Microwave heating, unlike the traditional heating methods, delivers the thermal energy to the substrate surfaces. It can effectively accelerate the formation of both silane and alcohol based monolayers. Alcohol based reagents, in particular, is proposed as an alternative building blocks for their widespread availability and minimal reactivity with moisture. Tuning of surface chemistry of silicon oxides have been achieved with alcohol based regents with different functional groups. Furthermore, the formation of mixed monolayers has been proposed as means of controlling oleophobicity of the silicon oxide surfaces. Finally, the film thickness of the alcohol based monolayers has been characterized with angle-resolved X-ray photoelectron spectroscopy (ARXPS). The film thickness can be precisely tuned by choosing the alcohol based reactants with particular lengths of alkyl chains. A variety of surface chemistry can be designed towards many practical applications requiring surface functionalized silicon oxides using the research presented herein.

Nanomaterials for Water Remediation

Nanomaterials for Water Remediation
Author: Ajay Kumar Mishra
Publisher: Smithers Rapra
Total Pages: 272
Release: 2016-07-14
Genre: Science
ISBN: 1911088033

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Nanomaterials have shown supreme potential in overcoming the major challenges posed by both the conventional as well as nano-enabled water purification systems. Remediation is the process of transforming the pollutants present in water from toxic to below the limits stipulated by national/international guidelines. Water remediation is the process of obtaining clean water from decontaminated water and is currently a huge challenge for the global scientific community.Volume 2 focuses on the use of inorganic oxides including metal and non-metal oxide materials for water remediation. This book also covers the broad discussion regarding various metal and non-metal oxides as well as nanoadsorbent metals, nanoparticles, cryogels and bentonites for the removal of the various organic and inorganic pollutants from wastewater. Water pollution is mainly caused by contaminants and can cause severe environmental and health issues. It is a well-established fact that nanomaterials have better adsorption capacity, selectivity and stability than nanoparticles.This book also covers the broad areas of nanotechnology, engineering, environmental science and water research, and will be of great benefit to researchers involved in these fields. The book provides a platform for all researchers as it covers considerable background from recent literature, including the abbreviations used. In addition, this book covers the broader research areas of chemistry, physics, materials science, composites, engineering and nanotechnology to present a multidisciplinary approach.

Designing Chemical Approaches for Organic Modification of Silicon Surfaces and Thermal Dry Etching of Cobalt Thin Films

Designing Chemical Approaches for Organic Modification of Silicon Surfaces and Thermal Dry Etching of Cobalt Thin Films
Author: Jing Zhao
Publisher:
Total Pages: 116
Release: 2018
Genre:
ISBN: 9780355734959

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Silicon and metal surfaces modified with organic molecule precursors are of great importance to the semiconductor and electronics industries. However, it is always a challenge to choose the most efficient precursors for forming a monolayer with surfaces and to investigate the chemical changes on surfaces by controlling critical conditions, such as surface temperature. In order to obtain a better understanding of the reactions between organic molecules and surfaces, we combined experimental results including infrared spectroscopy (IR), temperature programmed desorption (TPD), X-ray photoelectron spectroscopy (XPS), and microscopic studies together with density functional theory (DFT) studies. For silicon surface studies, we focused on determining the reaction step that plays the key role in halide precursors sticking probabilities and the influence of temperature on the formed monolayer. For metal surface studies, we focused on the etching method to control the layer thickness of thin metal films. ☐ During the process of achieving a halide-terminated Si (100) surface in ultrahigh vacuum (UHV), we compared the sticking probabilities of ethyl-chloride and ethyl-iodide reacting with a clean Si (100) surface using TPD and DFT studies. It has been demonstrated that the weakly bound precursor states of ethyl-halide on surfaces determines the sticking probabilities during adsorption. At the same time, we applied multivariate curve resolution (MCR), a mathematical method to simplify interpreting the complex TPD spectra resulting from the low sticking probability of ethyl-chloride adsorbing on silicon surfaces. ☐ In addition to halide-terminated Si (100) surfaces, amine-terminated Si (100) surfaces are reactive and potential for further modification. We studied the adsorption of triethylenediamine (TEDA) on a clean Si (100) surface as well as the adsorbents while varying temperature. The experimental techniques including IR, TPD, XPS and angular dependent near-edge X-Ray adsorption fine structure (NEXAFS) were supplemented by DFT calculations. We concluded that the adsorption process can be controlled by temperature: a datively bonded TEDA-Si-Si complex forms on the surface at room temperature as well as at cryogenic temperature with low exposure; heating above 400 K leads to C-N dissociation and ultimately the formation of surface nitride and carbide species. ☐ A thermal dry etching process of cobalt thin films was investigated using 1, 1, 1, 5, 5, 5 -hexafluoro-2, 4-pentanedione (hfacH). The chemical species resulting from thermal treatment were studied by IR, TPD, and XPS. The topography and morphology of the surfaces were investigated by atomic force microscopy (AFM) and scanning electron microscopy (SEM). The results indicated that the etching of cobalt can occur Hhfac, but not with halogens.