Atomic Layer Deposition Applications 3

Atomic Layer Deposition Applications 3
Author: Ana Londergan
Publisher: The Electrochemical Society
Total Pages: 300
Release: 2007
Genre: Atomic layer deposition
ISBN: 1566775736

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The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the symposium focus. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties. Following two successful years, this symposium is well on its way to becoming a forum for the sharing of cutting edge research in the various areas where ALD is used.

Atomic Layer Deposition

Atomic Layer Deposition
Author: Tommi Kääriäinen
Publisher: John Wiley & Sons
Total Pages: 274
Release: 2013-05-28
Genre: Technology & Engineering
ISBN: 1118062779

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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Atomic Layer Deposition in Energy Conversion Applications

Atomic Layer Deposition in Energy Conversion Applications
Author: Julien Bachmann
Publisher: John Wiley & Sons
Total Pages: 366
Release: 2017-03-15
Genre: Technology & Engineering
ISBN: 3527694838

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Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.

Atomic Layer Deposition for Semiconductors

Atomic Layer Deposition for Semiconductors
Author: Cheol Seong Hwang
Publisher: Springer Science & Business Media
Total Pages: 266
Release: 2013-10-18
Genre: Science
ISBN: 146148054X

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Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Atomic Layer Deposition of Nanostructured Materials

Atomic Layer Deposition of Nanostructured Materials
Author: Nicola Pinna
Publisher: John Wiley & Sons
Total Pages: 463
Release: 2012-09-19
Genre: Technology & Engineering
ISBN: 3527639926

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Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Atomic Layer Deposition Applications 7

Atomic Layer Deposition Applications 7
Author: J. W. Elam
Publisher: The Electrochemical Society
Total Pages: 353
Release: 2011
Genre:
ISBN: 1607682567

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Organometallic Chemistry

Organometallic Chemistry
Author: Timothy L. Easun
Publisher: Royal Society of Chemistry
Total Pages: 210
Release: 2018-11-28
Genre: Organometallic chemistry
ISBN: 1788010051

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With the increase in volume, velocity and variety of information, researchers can find it difficult to keep up to date with the literature in their field. Providing an invaluable resource, this volume contains analysed, evaluated and distilled information on the latest in organometallic chemistry research and emerging fields. The reviews range in scope and include π-coordinated arene metal complexes and catalysis by arene exchange, rylenes as chromophores in catalysts for CO2 photoreduction, metal nodes and metal sites in metal–organic frameworks, developments in molecular precursors for CVD and ALD, and multiphoton luminescence processes in f-element containing compounds.

Chemical Vapor Deposition for Nanotechnology

Chemical Vapor Deposition for Nanotechnology
Author: Pietro Mandracci
Publisher: BoD – Books on Demand
Total Pages: 166
Release: 2019-01-10
Genre: Technology & Engineering
ISBN: 1789849608

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Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.

Atomic Layer Deposition Applications 6

Atomic Layer Deposition Applications 6
Author: J. W. Elam
Publisher: The Electrochemical Society
Total Pages: 469
Release: 2010-10
Genre: Science
ISBN: 1566778212

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The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the focus of this reoccurring symposium. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topographies with controlled thickness and composition. This issue of ECS Transactions contains peer reviewed papers presented at the symposium. A broad spectrum of ALD applications is featured, including novel nano-composites and nanostructures, dielectrics for state-of-the-art transistors and capacitors, optoelectronics, and a variety of other emerging applications.

Atomic Layer Deposition Applications 5

Atomic Layer Deposition Applications 5
Author: S. de Gendt
Publisher: The Electrochemical Society
Total Pages: 425
Release: 2009-09
Genre:
ISBN: 1566777410

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Atomic Layer Deposition can enable precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties for a wide range of applications.