Charged Semiconductor Defects

Charged Semiconductor Defects
Author: Edmund G. Seebauer
Publisher: Springer
Total Pages: 298
Release: 2008-12-01
Genre: Science
ISBN: 9781848820586

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Defects in semiconductors have been studied for many years, in many cases with a view toward controlling their behaviour through various forms of “defect engineering”. For example, in the bulk, charging significantly affects the total concentration of defects that are available to mediate phenomena such as solid-state diffusion. Surface defects play an important role in mediating surface mass transport during high temperature processing steps such as epitaxial film deposition, diffusional smoothing in reflow, and nanostructure formation in memory device fabrication. “Charged Defects in Semiconductors” details the current state of knowledge regarding the properties of the ionized defects that can affect the behaviour of advanced transistors, photo-active devices, catalysts, and sensors. Features: group IV, III-V, and oxide semiconductors; intrinsic and extrinsic defects; and, point defects, as well as defect pairs, complexes and clusters.

Photo-induced Defects in Semiconductors

Photo-induced Defects in Semiconductors
Author: David Redfield
Publisher: Cambridge University Press
Total Pages: 231
Release: 1996-01-26
Genre: Science
ISBN: 0521461960

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A thorough review of the properties of deep-level, localized defects in semiconductors.

Advanced Calculations for Defects in Materials

Advanced Calculations for Defects in Materials
Author: Audrius Alkauskas
Publisher: John Wiley & Sons
Total Pages: 374
Release: 2011-05-16
Genre: Science
ISBN: 3527638539

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This book investigates the possible ways of improvement by applying more sophisticated electronic structure methods as well as corrections and alternatives to the supercell model. In particular, the merits of hybrid and screened functionals, as well as of the +U methods are assessed in comparison to various perturbative and Quantum Monte Carlo many body theories. The inclusion of excitonic effects is also discussed by way of solving the Bethe-Salpeter equation or by using time-dependent DFT, based on GW or hybrid functional calculations. Particular attention is paid to overcome the side effects connected to finite size modeling. The editors are well known authorities in this field, and very knowledgeable of past developments as well as current advances. In turn, they have selected respected scientists as chapter authors to provide an expert view of the latest advances. The result is a clear overview of the connections and boundaries between these methods, as well as the broad criteria determining the choice between them for a given problem. Readers will find various correction schemes for the supercell model, a description of alternatives by applying embedding techniques, as well as algorithmic improvements allowing the treatment of an ever larger number of atoms at a high level of sophistication.

Multiscale Modeling in Semiconductors

Multiscale Modeling in Semiconductors
Author: Yu Jin
Publisher:
Total Pages: 109
Release: 2017
Genre:
ISBN:

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This work is aimed to build a model framework to predict device performance based on the formation of defects in order to meet the demand for higher-performance integrated circuits and solar cells. We use a multiscale modeling technique to investigate the properties of some important defects. Those defects play important roles in the study of precipitation, diffusion and recombination in semiconductors. Ab initio (density functional theory, DFT) calculations are used to extract critical parameters at atomic scale and to verify key mechanisms, while continuum modeling is conducted to describe the defects’ kinetics and interactions at device scale. Combining process/device simulation and the fundamental understanding at atomic scale, we can gain insight about how process conditions can affect defect formation and therefore device performance. Thus, this multiscale modeling framework can provide useful guidance in performance optimization and cost reduction. Based on this approach, we have developed models for carbon clustering and associated metal gettering, which can be used to reduce noise in advanced silicon CMOS image sensor. We have also advanced models for oxygen precipitation in silicon by considering morphology evolution, dynamic interactions with point defects, and doping dependency. The carbon and oxygen precipitation processes are modeled using the reduced moment-based model (RKPM) with improved computation efficiency. The impact of charged grain boundaries on device performance, as well as electron beam induced current (EBIC) imaging measurement, of CdTe solar cell has been investigated in detail. Based on our simulation results, we propose that passivation with accumulated grain boundaries will be more beneficial to the performance of CdTe solar cell, while depleted grain boundaries generally degrade performance. We also conduct a series of DFT calculations to investigate the light induced degradation (LID) related defects in silicon solar cell. Based on these calculations, a comprehensive model for light induced degradation is proposed which matches experimental observation under full range of conditions.

Defects and Diffusion in Semiconductors - an Annual Retrospective VIII

Defects and Diffusion in Semiconductors - an Annual Retrospective VIII
Author: David J. Fisher
Publisher: Trans Tech Publications Ltd
Total Pages: 352
Release: 2005-10-01
Genre: Technology & Engineering
ISBN: 3038130338

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This eighth volume in the series covering the latest results in the field includes abstracts of papers which appeared between the publication of Annual Retrospective VII (Volumes 230-232) and the end of 2005 (allowing for vagaries of journal availability).

Defects and Diffusion in Semiconductors

Defects and Diffusion in Semiconductors
Author: David J. Fisher
Publisher: Trans Tech Publications Ltd
Total Pages: 320
Release: 1998-07-16
Genre: Technology & Engineering
ISBN: 3035706794

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This issue, and the ones which will follow year-by-year, can be regarded not only as supplements to the recent special 10-year retrospective volumes on Diffusion in Silicon (volumes 153-155) and Diffusion in III-V Compounds (volumes 157-159), but also as a return to the 'regular business' of Diffusion and Defect Forum's 30-year project of succinctly summarising recent progress in these fields. The present volume abstracts those papers published during the approximate period from June 1997 to June 1998. Earlier papers have been included in order to make sure that the coverage is contiguous with volume 152 of Defect and Diffusion Forum; the most recent 'regular' issue. Due to vagaries in publication schedules, the 1998 cut-off point is not exact, but any omissions will be corrected in the next annual retrospective. General priority has been given to the most accessible work and, in particular, to those papers which furnish original data or report important new techniques, phenomena or anomalies. Lesser priority has been given to reviews and to entirely theoretical work.

Defects and Transport in Oxides

Defects and Transport in Oxides
Author: Robert Jaffee
Publisher: Springer Science & Business Media
Total Pages: 598
Release: 2013-11-21
Genre: Technology & Engineering
ISBN: 1461587239

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DEFECTS AND TRANSPORT IN OXIDES is the proceedings of the eighth Battelle Colloquium in the Materials Sciences, held in Columbus and Salt Fork, Ohio, September 17-22, 1973. It took as its theme the relationship between defects and transport of both mass and charge in oxides. Applications of defect-controlled transport to a number of important processes in oxides also were covered. In selecting this topic, the Organizing Committee thought that 1973 was timely to bring together the leading theoretical and experimental researchers in the oxide transport field to review its status in a critical way, and to consider current major research directions and how research in the future might be guided into fruitful areas. The meeting was highlighted by the presentation of several papers which suggest that major advances in our understanding of transport in oxides appear to be imminent. These papers dealt with the results of new theoretical approaches whereby the energies and configurations of defects may be calculated, and with new experimental techniques for indirectly observing these defects, previously thought to be below the limits of experimental resolving power. Other papers, dealing with the application of defect chemistry to technological processes, served to demonstrate the successes and to point out yet unresolved problems associated with ix x PREFACE understanding the chemistry of imperfect crystals.

Defects and Diffusion in Semiconductors IV

Defects and Diffusion in Semiconductors IV
Author: David J. Fisher
Publisher: Trans Tech Publications Ltd
Total Pages: 500
Release: 2001-11-30
Genre: Technology & Engineering
ISBN: 303570709X

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This fourth volume in the series covering the latest results in the field includes abstracts of papers which appeared within the approximate period of mid-2000 to mid-2001. The scope of this coverage includes, in addition to traditional semiconductors, the increasingly important carbide, nitride and silicide semiconductors. Semiconducting oxides are not covered, as information on these can be found in the "Defects and Diffusion in Ceramics Retrospective" series. The increasing interest in ceramic-type semiconductors is again reflected by the invited papers, which include an extensive review of the particular problems involved in growing GaN films on sapphire substrates. Nevertheless, established semiconductors continue to spring surprises and to offer new problems and these are also addressed here by a number of further detailed reviews of work on Si, InP and InGaP. Finally, new results are to be found here concerning diffusive processes and defect behaviour in Ge, GeSi, InGaAs, Si and ZnSe. Altogether, these 8 long reviews, 9 research papers and 752 selected abstracts provide an invaluable and up-to-date insight into current and future trends in semiconductor theory, processing and applications.