Improvements to III-nitride Light-emitting Diodes Through Characterization and Material Growth

Improvements to III-nitride Light-emitting Diodes Through Characterization and Material Growth
Author: Amorette Rose Klug Getty
Publisher:
Total Pages: 426
Release: 2009
Genre:
ISBN: 9781109483079

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A variety of experiments were conducted to improve or aid the improvement of the efficiency of III-nitride light-emitting diodes (LEDs), which are a critical area of research for multiple applications, including high-efficiency solid state lighting.

Growth and Characterization of III-nitride Materials for High Efficiency Optoelectronic Devices by Metalorganic Chemical Vapor Deposition

Growth and Characterization of III-nitride Materials for High Efficiency Optoelectronic Devices by Metalorganic Chemical Vapor Deposition
Author: Suk Choi
Publisher:
Total Pages:
Release: 2012
Genre: Light emitting diodes
ISBN:

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Efficiency droop is a critical issue for the Group III-nitride based light-emitting diodes (LEDs) to be competitive in the general lighting application. Carrier spill-over have been suggested as an origin of the efficiency droop, and an InAlN electron-blocking layer (EBL) is suggested as a replacement of the conventional AlGaN EBL for improved performance of LED. Optimum growth condition of InAlN layer was developed, and high quality InAlN layer was grown by using metalorganic chemical vapor deposition (MOCVD). A LED structure employing an InAlN EBL was grown and its efficiency droop performance was compared with a LED with an AlGaN EBL. Characterization results suggested that the InAlN EBL delivers more effective electron blocking over AlGaN EBL. Hole-injection performance of the InAlN EBL was examined by growing and testing a series of LEDs with different InAlN EBL thickness. Analysis results by using extended quantum efficiency model shows that further improvement in the performance of LED requires better hole-injection performance of the InAlN EBL. Advanced EBL structures such as strain-engineered InAlN EBL and compositionally-graded InAlN EBLs for the delivery of higher hole-injection efficiency were also grown and tested.

Optoelectronic Devices

Optoelectronic Devices
Author: M Razeghi
Publisher: Elsevier
Total Pages: 602
Release: 2004
Genre: Science
ISBN: 9780080444260

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Tremendous progress has been made in the last few years in the growth, doping and processing technologies of the wide bandgap semiconductors. As a result, this class of materials now holds significant promis for semiconductor electronics in a broad range of applications. The principal driver for the current revival of interest in III-V Nitrides is their potential use in high power, high temperature, high frequency and optical devices resistant to radiation damage. This book provides a wide number of optoelectronic applications of III-V nitrides and covers the entire process from growth to devices and applications making it essential reading for those working in the semiconductors or microelectronics. Broad review of optoelectronic applications of III-V nitrides

Novel Approaches to High-Efficiency III-V Nitride Heterostructure Emitters for Next-Generation Lighting Applications

Novel Approaches to High-Efficiency III-V Nitride Heterostructure Emitters for Next-Generation Lighting Applications
Author:
Publisher:
Total Pages:
Release: 2004
Genre:
ISBN:

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We report research activities and technical progress on the development of high-efficiency long wavelength ([lambda] ≈ 540nm) green light emitting diodes which covers the first year of the three-year program ''Novel approaches to high-efficiency III-V nitride heterostructure emitters for next-generation lighting applications''. The first year activities were focused on the installation, set-up, and use of advanced equipment for the metalorganic chemical vapor deposition growth of III-nitride films and the characterization of these materials (Task 1) and the design, fabrication, testing of nitride LEDs (Task 4). As a progress highlight, we obtained improved quality of ≈ 2 [mu]m-thick GaN layers (as measured by the full width at half maximum of the asymmetric (102) X-ray diffraction peak of less than 350 arc-s) and higher p-GaN:Mg doping level (free hole carrier higher than 1E18 cm−3). Also in this year, we have developed the growth of InGaN/GaN active layers for long-wavelength green light emitting diodes, specifically, for emission at [lambda] ≈ 540nm. The effect of the Column III precursor (for Ga) and the post-growth thermal annealing effect were also studied. Our LED device fabrication process was developed and initially optimized, especially for low-resistance ohmic contacts for p-GaN:Mg layers, and blue-green light emitting diode structures were processed and characterized.

Light Emitting Diodes and Dilute Magnetic Semiconductors in the III-Nitride Materials System

Light Emitting Diodes and Dilute Magnetic Semiconductors in the III-Nitride Materials System
Author:
Publisher:
Total Pages:
Release: 2004
Genre:
ISBN:

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The purpose of this research has been to produce novel light emitting diodes in the III-nitride materials system via metal organic vapor phase epitaxy. Three distinct types of devices were grown: 1) blue light emitting diodes with a peak wavelength of 445 nm were grown on sapphire substrates, 2) blue light emitting diodes were grown on ruby substrates to produce dual wavelength light emitters with peak wavelengths of 430 nm and 694 nm, and 3) ultraviolet light emitting diodes with a quaternary active region with a peak wavelength of 340 nm were grown on sapphire substrates. The diodes' characteristics are examined and iteratively improved based on feedback from characterization. Modifications to the metalorganic chemical vapor deposition system's physical configuration and growth parameters have also been employed to improve material properties. The dual wavelength light emitting diodes have been produced as a first step towards the realization of a monolithic white light emitting diode for potential use in solid state lighting applications. These dual wavelength devices were grown on chromium doped sapphire substrates (also known as ruby). The high energy photons originating in the III-nitride active region photoexcite chromium atoms within the ruby substrate which subsequently emit red photons. In this manner a compact dual emitter of both red and blue photons is realized. The quaternary ultraviolet light emitting diodes were demonstrated as a potential path towards more efficient short wavelength emitters in the group III-nitride materials system. The incorporation of a small percentage of indium has been shown to increase the radiative recombination efficiency of AlGaN layers due to induced carrier localization at indium fluctuations. Ultraviolet light emitting diodes emitting at a peak wavelength of 340 nm were demonstrated using this approach. An investigation of the ferromagnetic properties Mn-doped GaN dilute magnetic semiconductors on the material's Fermi en.

Light Extraction Efficiency of Nanostructured III-nitride Light Emitting Diodes

Light Extraction Efficiency of Nanostructured III-nitride Light Emitting Diodes
Author: Yu Kee Ooi
Publisher:
Total Pages: 149
Release: 2019
Genre: Light emitting diodes
ISBN:

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"III-nitride materials have been extensively employed in a wide variety of applications attributed to their compact sizes, lower operating voltage, higher energy efficiency and longer lifetime. Although tremendous progress has been reported for III-nitride light-emitting diodes (LEDs), further enhancement in the external quantum effciency ([eta]_EQE), which depends upon internal quantum efficiency, injection efficiency and light extraction efficiency ([eta]_extraction), is essential in realizing next generation high-efficiency ultraviolet (UV) and visible LEDs. Several challenges such as charge separation issue, large threading dislocation density, large refractive index contrast between GaN and air, and anisotropic emission at high Al-composition AlGaN quantum wells in the deep-UV regime have been identified to obstruct the realization of high-brightness LEDs. As a result, novel LED designs and growth methods are highly demanded to address those issues. The objective of this dissertation is to investigate the enhancement of [eta]_extraction for various nanostructured III-nitride LEDs. In the first part, comprehensive studies on the polarization-dependent [eta]_extraction for AlGaN-based flip-chip UV LEDs with microdome-shaped patterned sapphire substrates (PSS) and AlGaN-based nanowire UV LEDs are presented. Results show that the microdome-shaped PSS acts as an extractor for transverse-magnetic (TM)-polarized light where up to ~11.2-times and ~2.6-times improvement in TM-polarized [eta]_extraction can be achieved for 230 nm and 280 nm flip-chip UV LEDs, while as a reflector that limits the extraction of transverse-electric (TE)-polarized light through the sapphire substrate. Analysis for 230 nm UV LEDs with nanowire structure shows up to ~48% TM-polarized [eta]_extraction and ~41% TE-polarized [eta]_extraction as compared to the conventional planar structure (~0.2% for TM-polarized [eta]_extraction and ~2% for TE-polarized [eta]_extraction). Plasmonic green LEDs with nanowire structure have also been investigated for enhancing the LED performance via surface plasmon polaritons. The analysis shows that both [eta]_extraction and Purcell factor for the investigated plasmonic nanowire LEDs are independent of the Ag cladding layer thickness (H_Ag), where a Purcell factor of ~80 and [eta]_extraction of ~65% can be achieved when H_Ag > 60 nm. Nanosphere lithography and KOH-based wet etching process have been developed for the top-down fabrication of III-nitride nanowire LEDs. The second part of this dissertation focuses on alternative approaches to fabricate white LEDs. The integration of three-dimensional (3D) printing technology with LED fabrication is proposed as a straightforward and highly reproducible method to improve [eta[_extraction at the same time to achieve stable white color emission. The use of optically transparent acrylate-based photopolymer with a refractive index of ~1.5 as 3D printed lens on blue LED has exhibited 9% enhancement in the output power at current injection of 4 mA as compared to blue LED without 3D printed lens. Stable white color emission can be achieved with chromaticity coordinates around (0.27, 0.32) and correlated color temperature ~8900 K at current injection of 10 mA by mixing phosphor powder in the 3D printed lens. Novel LED structures employing ternary InGaN substrates are then discussed for realizing high-efficiency monolithic tunable white LEDs. Results show that large output power (~170 mW), high [eta]_EQE (~50%), chromaticity coordinates around (0.30, 0.28), and correlated color temperature ~8200 K can be achieved by engineering the band structures of the InGaN/InGaN LEDs on ternary InGaN substrates."--Abstract.

III-nitride Devices and Nanoengineering

III-nitride Devices and Nanoengineering
Author: Zhe Chuan Feng
Publisher: World Scientific
Total Pages: 477
Release: 2008
Genre: Technology & Engineering
ISBN: 1848162235

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Devices, nanoscale science and technologies based on GaN and related materials, have achieved great developments in recent years. New GaN-based devices such as UV detectors, fast p-HEMT and microwave devices are developed far more superior than other semiconductor materials-based devices.Written by renowned experts, the review chapters in this book cover the most important topics and achievements in recent years, discuss progress made by different groups, and suggest future directions. Each chapter also describes the basis of theory and experiment.This book is an invaluable resource for device design and processing engineers, material growers and evaluators, postgraduates and scientists as well as newcomers in the GaN field.

Catalyst-free III-nitride Nanowires by Plasma-assisted Molecular Beam Epitaxy

Catalyst-free III-nitride Nanowires by Plasma-assisted Molecular Beam Epitaxy
Author: Santino D. Carnevale
Publisher:
Total Pages: 189
Release: 2013
Genre:
ISBN:

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Abstract: In the past twenty years, III-nitride devices have had an enormous impact on semiconductor-based technologies. This impact is seen in both optoelectronic and electronic devices. The aim of this dissertation is to take advantage of III-nitride nanowires grown by plasma-assisted molecular beam epitaxy to form heterostructures that are difficult or impossible to achieve in traditional, thin films. To do this, it is first necessary to establish the growth phase diagrams that correlate the characteristics of GaN nanowires to MBE growth conditions. By using the information in these growth maps we can control growth kinetics and the resulting nanowire structures by making strategic, timely changes to growth conditions. Using this control electronic and optoelectronic III-nitride nanowire devices are created. First, coaxially-oriented AlN/GaN nanowire resonant tunneling diodes are formed on Si substrates. Second, polarization-induced nanowire light emitting diodes (PINLEDs) are fabricated that exhibit electroluminescence at wavelengths from the deep UV into the visible. Because these PINLEDs utilize polarization doping, they can be formed with and without the use of dopants. Device and structural characterization are provided, including a detailed investigation of the mixed material polarity in these nanowires. Finally, the dissertation closes with a discussion of recent work and future ideas for optimizing the PINLED design.

Nitride Semiconductors: Volume 482

Nitride Semiconductors: Volume 482
Author: Materials Research Society. Meeting
Publisher:
Total Pages: 1274
Release: 1998-04-20
Genre: Technology & Engineering
ISBN:

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This book is on recent experimental and theoretical progress in the rapidly growing field of III-V nitrides. Issues related to crystal growth (bulk and thin films), structure and microstructure, formation of defects, doping, alloying, formation of heterostructures, determination of physical properties and device fabrication and evaluation are addressed. Papers show much progress in the growth and understanding of III-V nitrides and in the production of optoelectronic devices based on these materials. Most exciting is the fact that light-emitting diodes and laser diodes have now reached amazing levels of performance which forecasts a revolution in lighting, optical storage, printing, and display technologies. Topics include: crystal growth- bulk growth, early stages of epitaxy; crystal growth- MOCVD; growth techniques - MBE and HVPE; novel substrates and growth techniques; structural properties; electronic properties; luminescence and recombination; characterization, elemental and stress analysis; physical modelling; device processing, implantation, annealing; device characterization, contacts, degradation; and injection laser diodes and applications.