Plasma Diagnostics

Plasma Diagnostics
Author: Orlando Auciello
Publisher: Academic Press
Total Pages: 470
Release: 2013-10-22
Genre: Science
ISBN: 1483216241

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Plasma Diagnostics, Volume 1: Discharge Parameters and Chemistry covers seven chapters on the important diagnostic techniques for plasmas and details their use in particular applications. The book discusses optical diagnostic techniques for low pressure plasmas and plasma processing; plasma diagnostics for electrical discharge light sources; as well as Langmuir probes. The text also describes the mass spectroscopy of plasmas, microwave diagnostics, paramagnetic resonance diagnostics, and diagnostics in thermal plasma processing. Electrical engineers, nuclear engineers, microwave engineers, chemists, and technical personnel in universities, industry, and national laboratories will find the book invaluable.

Handbook of Advanced Plasma Processing Techniques

Handbook of Advanced Plasma Processing Techniques
Author: R.J. Shul
Publisher: Springer Science & Business Media
Total Pages: 664
Release: 2000-08-28
Genre: Science
ISBN: 9783540667728

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This volume covers the topic of advanced plasma processing techniques, from the fundamental physics of plasmas to diagnostics, modeling and applications such as etching and deposition for microelectronics. The use of plasmas for patterning on a submicron scale has enabled successive generations of continually smaller transistors, lasers, micromachines, sensors and magnetic read/write heads that have formed the basis of our information age. This volume is the first to give coverage to this broad area of topics in a detailed fashion, especially in the rapidly expanding fields of micro-mechanical machines, photomask fabrication, magnetic data storage and reactor modeling. It provides the reader with a broad array of topics, authored by the leading experts in the field.

Plasma Diagnostics

Plasma Diagnostics
Author: W. Lochte-Holtgreven
Publisher:
Total Pages: 954
Release: 1968
Genre: Science
ISBN:

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Market: Plasma physicists and students. Upon publication in 1968, Plasma Diagnostics represented the most up- to-date survey of the experimental methods used in plasma analysis, including the necessary theoretical background. This work emphasizes spectroscopic techniques along with in-depth sections on laser techniques and electric and magnetic probe methods. The evaluation of collision and transport cross sections, heat and electrical conductivity, and viscosity are some of the many applications of plasma diagnostics reviewed as well. This long-awaited reprint volume is of interest to both physicists and students of theoretical physics as it deals with plasma theory from a fundamental point of view, stressing a careful derivation and discussion of the equations.

Electric Probes in Stationary and Flowing Plasmas

Electric Probes in Stationary and Flowing Plasmas
Author: P.M. Chung
Publisher: Springer Science & Business Media
Total Pages: 163
Release: 2013-03-12
Genre: Science
ISBN: 3642658865

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The electric probe has long been used as a fundamental diagnostic tool for measuring the local properties of a plasma. Since Langmuir first developed the electric-probe technique in 1924, probes have been used to measure electron densities and temperatures in a wide variety of gaseous ionized media, such as electric discharges, afterglows, ionizing shock waves, flames, MHD, and plasma-jet flows, reentry vehicle flow fields, and atmospheric and space plasmas. The first systematic account of modern theories of electriC-probe behavior was given by Chen (1965), who also provided practical information on experimental techniques. A subsequent survey by Swift and Schwar (1970), which was representative of results contained in the literature through 1969, included additional information on some of the modern theories and on practical details of probe utilization. The purpose of this volume is to supplement the previously mentioned two works by providing an account of a large body of the up-to-date informa tion available on electric probes, particularly in the areas of transitional and continuum-flow phenomena, and by offering, for all domains of probe appli cation, a critical appraisal of the more significant probe theories and experi mental investigations in the literature.

Cold Plasma in Food and Agriculture

Cold Plasma in Food and Agriculture
Author: NN Misra
Publisher: Academic Press
Total Pages: 382
Release: 2016-07-15
Genre: Technology & Engineering
ISBN: 012801489X

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Cold Plasma in Food and Agriculture: Fundamentals and Applications is an essential reference offering a broad perspective on a new, exciting, and growing field for the food industry. Written for researchers, industry personnel, and students interested in nonthermal food technology, this reference will lay the groundwork of plasma physics, chemistry, and technology, and their biological applications. Food scientists and food engineers interested in understanding the theory and application of nonthermal plasma for food will find this book valuable because it provides a roadmap for future developments in this emerging field. This reference is also useful for biologists, chemists, and physicists who wish to understand the fundamentals of plasma physics, chemistry, and technology and their biological interactions through applying novel plasma sources to food and other sensitive biomaterials. Examines the topic of cold plasma technology for food applications Demonstrates state-of-the-art developments in plasma technology and potential solutions to improve food safety and quality Presents a solid introduction for readers on the topics of plasma physics and chemistry that are required to understand biological applications for foods Serves as a roadmap for future developments for food scientists, food engineers, and biologists, chemists, and physicists working in this emerging field

Plasma Diagnostics

Plasma Diagnostics
Author: A. A. Ovsyannikov
Publisher: Cambridge Int Science Publishing
Total Pages: 585
Release: 2000
Genre: Lasers in plasma diagnostics
ISBN: 1898326231

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The book contains the results of investigations of electro-physical, chemical, gas-dynamic and other processes in low-temperature plasma and their diagnostics. Both conventional spectral and optical methods of diagnostics and new and laser methods are examined, together with electrostatic probes for investigating rarefied and dense plasma, especially in the presence of chemical reactions. Problems of probe calorimetry of plasma flows are investigated and approaches to measuring the spatial and time characteristics of plasma outlined. Procedural problems of processing experimental data and automating diagnostic experiments are discussed.

Lecture Notes on Principles of Plasma Processing

Lecture Notes on Principles of Plasma Processing
Author: Francis F. Chen
Publisher: Springer Science & Business Media
Total Pages: 213
Release: 2012-12-06
Genre: Science
ISBN: 1461501814

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Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Langmuir Probe in Theory and Practice

Langmuir Probe in Theory and Practice
Author: Evgeny V. Shun'ko
Publisher: Universal-Publishers
Total Pages: 251
Release: 2009
Genre: Science
ISBN: 1599429357

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From flat-panel televisions to thermonuclear fusion for energy production, plasmas currently have numerous and wide applications in sciences and industry. A diversity of plasma diagnostics is available to physicists and engineers to measure and control plasma parameters. Among them, the Langmuir probe is the most inexpensive and most popular instrument and method. The Langmuir probe is a small electrode which is submerged in plasma in order to measure the probe current-voltage characteristic. The same characteristic is processed further to derive the electron and ion concentration, the electron distribution function, and the plasma potential at the probe location. Langmuir probe diagnostics afford rapid measurements of the electron distribution function and plasma potential at a good time resolution, 10-8 seconds in a wide range of plasma densities 10+3 - 10+14 cm-3, and the electron energy from the room temperature to hundreds of electron-volts - qualities which are essential for researchers. In view of these facts, Langmuir probe diagnostics are applied very frequently to measuring plasma parameters. This book will be useful in teaching plasma diagnostics to undergraduate and graduate students in plasma physics courses. And it will also serve as a practical reference manual for physicists and engineers working in the growing area of plasma physics. The reader of this book will learn what kind of plasma parameters the Langmuir probe can measure, how to develop the probe diagnostics for specific cases, and how the probe data obtained should be processed to deduce reliable plasma parameters. In this book, the reader can find not only the basic physics information important to understanding the principles of probe operation, but also how the "real" probe disturbs plasma, and how it is possible to reconstruct undisturbed plasma parameters with available probe data.